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作者 Council, National Research
書名 Database Needs for Modeling and Simulation of Plasma Processing
出版項 Washington, D.C. : National Academies Press, 1996
©1996
國際標準書號 9780309573535 (electronic bk.)
9780309055918
book jacket
說明 1 online resource (74 pages)
text txt rdacontent
computer c rdamedia
online resource cr rdacarrier
附註 Database Needs for Modeling and Simulation of Plasma Processing -- Copyright -- Preface -- Contents -- Executive Summary -- FINDINGS -- CONCLUSIONS -- RECOMMENDATIONS -- REFERENCES -- 1 Industrial Perspectives -- INTRODUCTION -- PLASMA PROCESSING FOR SEMICONDUCTOR MANUFACTURING -- PLASMA EQUIPMENT SUPPLIER PERSPECTIVES -- CHIP MANUFACTURER PERSPECTIVES -- RECOMMENDED PRIORITIES FOR DEVELOPMENT OF AN IMPROVED DATABASE -- FINDINGS -- CONCLUSIONS -- REFERENCES -- 2 Tool Scale and Feature Scale Models -- INTRODUCTION -- TOOL SCALE MODELS -- Capabilities Needed for Tool Scale Models -- Barriers to Using Tool Scale Models -- FEATURE SCALE MODELS -- GENERAL ASSESSMENT OF MODELING STATE OF THE ART AND VISION OF FUTURE CAPABILITY AND IMPLIED NEEDS -- FINDINGS -- CONCLUSIONS -- REFERENCES -- 3 Radiative Processes and Diagnostics -- INTRODUCTION -- TECHNIQUES FOR MEASUREMENTS OF GAS PHASE SPECIES -- Information Resources -- Roles of the Database In Motivating Diagnostic Experiments -- SURFACE REACTION DATABASE AND DIAGNOSTICS -- Information Resources -- New Diagnostic Techniques -- FINDINGS -- REFERENCES -- 4 Heterogeneous Processes -- INTRODUCTION -- STATE OF THE DATABASE -- TECHNIQUES FOR IMPROVING THE DATABASE -- Approach -- Measurements On Realistic Plasma Reactors -- Incident Flux and Desorbing Flux Analysis -- Condition of the Surface -- Technology -- Ultrahigh-Vacuum Approach Using Mass and Energy Selected Reactive Beams -- Particle Beams -- Sticking Coefficients -- Synergistic Effects -- Substrate Temperature Dependence -- Angle Dependence -- Computer Simulations -- FINDINGS -- REFERENCES -- 5 Electron Collision Processes -- INTRODUCTION -- IONIZATION -- Atoms -- Molecules -- Theoretical Methods and Advances -- Neutral Dissociation -- ELECTRON-IMPACT EXCITATION -- ATTACHMENT -- MOMENTUM TRANSFER, SWARM, AND DISCHARGE MEASUREMENTS -- GENERAL COMMENTS
FINDINGS -- REFERENCES -- 6 Ion Processes, Neutral Chemistry, And Thermochemical Data -- INTRODUCTION -- CROSS SECTIONS AND RATE COEFFICIENTS -- Ion Processes -- Momentum Transfer -- Ion-Molecule and Charge Exchange Reactions -- Ion-Ion Neutralization -- Electron-Ion Recombination -- Ion-Neutral and Neutral-Neutral Excitation -- Neutral Chemistry -- Status of the Database -- Excited State Chemistry and Penning Ionization -- Summary -- Ion Processes -- Neutral Chemistry -- THERMOCHEMICAL DATA -- FINDINGS -- REFERENCES -- Appendix A: Acronyms and Abbreviations -- Appendix B: Workshop Agenda -- Appendix C: Workshop Participants
Description based on publisher supplied metadata and other sources
Electronic reproduction. Ann Arbor, Michigan : ProQuest Ebook Central, 2020. Available via World Wide Web. Access may be limited to ProQuest Ebook Central affiliated libraries
鏈接 Print version: Council, National Research Database Needs for Modeling and Simulation of Plasma Processing Washington, D.C. : National Academies Press,c1996 9780309055918
主題 Semiconductors -- Design and construction -- Congresses.;Plasma engineering -- Databases -- Congresses.;Plasma engineering -- Computer simulation -- Congresses
Electronic books
Alt Author Sciences, Division on Engineering and Physical
Commission on Physical Sciences, Mathematics, and Applications
Processing, Panel on Database Needs in Plasma
National Academy of Sciences,
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